Robust quantum point contact operation of narrow graphene constrictions patterned by AFM cleavage lithography
Péter Kun, Bálint Fülöp, Gergely Dobrik, Péter Nemes Incze, István Endre Lukács, Szabolcs Csonka, Chanyong Hwang, Levente Tapasztó NPJ 2D MATERIALS AND APPLICATIONS 2397-7132 2020 View on: MTMT: 31779701 | DOI: 10.1038/s41699-020-00177-x | REAL: 119174 | WoS: 000596515200001 | Scopus: 85097289521 | Egyéb URL: http://www.nature.com/articles/s41699-020-00177-x | Google scholar: 9734827990400207997