Improved process flow for buried channel fabrication in silicon

Zoltán Fekete, Anita Pongrácz, Péter Fürjes, Gábor Battistig

MICROSYSTEM TECHNOLOGIES 0946-7076
2012

View on: MTMT: 1829134 | DOI: 10.1007/s00542-012-1430-3 | WoS: 000300589500014 | Scopus: 84861530786 | Teljes dokumentum: http://link.springer.com/content/pdf/10.1007%2Fs00542-012-1430-3.pdf