Robust quantum point contact operation of narrow graphene constrictions patterned by AFM cleavage lithography

Péter Kun, Bálint Fülöp, Gergely Dobrik, Péter Nemes Incze, István Endre Lukács, Szabolcs Csonka, Chanyong Hwang, Levente Tapasztó

NPJ 2D MATERIALS AND APPLICATIONS 2397-7132
2020

View on: MTMT: 31779701 | DOI: 10.1038/s41699-020-00177-x | REAL: 119174 | WoS: 000596515200001 | Scopus: 85097289521 | Egyéb URL: http://www.nature.com/articles/s41699-020-00177-x | Google scholar: 9734827990400207997